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low pressure CVD (LPCVD)

Low PressureChemical Vapour Deposition (LPCVD) is a coating process which, in contrast to the other CVD processes, Chemical Vapour Deposition, works with negative pressure.

The LPCVD process is used to produce the thinnest silicon layers from silicon nitride or silicon oxynitride. The advantage of the LPCVD process is the density and uniform distribution of the coating. The LPCVD process is carried out at a temperature of 900 °C.

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Englisch: low pressure CVD - LPCVD
Updated at: 11.10.2013
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