Deep Ultraviolet (DUV) is short-wave UV light with a wavelength
of 193 nm or 248 nm. DUV light with these wavelengths is used in optical lithography for chip fabrication because it can be used to create fine chip structures. Even finer chip structures are created with even shorter wavelengths using Extreme Ultraviolet Lith
Deep Ultraviolet is a high-speed lithography technique suitable for large area masks of discrete components. The ultraviolet light used for DUV lithography has wavelengths of 193 nm and 248 nm. In this technique, the mask is magnified by an optical lens system and projected onto the wafer. An improvement in resolution can be enhanced by introducing water between the lens and the wafer, as water has a higher refractive index compared to air. This technique is called immersion technique.