ITWissen.info - Tech know how online

atmospheric pressure chemical vapour deposition (APCVD)

Atmospheric PressureCVD (APCVD) is a coating process, Chemical Vapour Deposition (CVD), which is used to produce doped and undoped oxides and works with atmospheric pressure. In the APCVD process, silicon-based gases and oxygen react to form silicon dioxide (SiO2), which is deposited as a layer on the wafer.

Informationen zum Artikel
Englisch: atmospheric pressure chemical vapour deposition - APCVD
Updated at: 10.06.2012
#Words: 48
Links:
Translations: DE