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atmospheric pressure chemical vapour deposition (APCVD)

Atmospheric PressureCVD (APCVD) is a coating process, Chemical Vapour Deposition ( CVD), which is used to produce doped and undoped oxides and works with atmospheric pressure. In the APCVD process, silicon-based gases and oxygen react to form silicon dioxide ( SiO2), which is deposited as a layer on the wafer.

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Englisch: atmospheric pressure chemical vapour deposition - APCVD
Updated at: 10.06.2012
#Words: 47
Links: coating, process, chemical vapour deposition (chip design) (CVD), pressure, indium (In)
Translations: DE
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